L. Dumas et al., Characterization of magnesium fluoride thin films deposited by direct electron beam evaporation, J VAC SCI A, 18(2), 2000, pp. 465-469
Magnesium fluoride films have been deposited on quartz and silicon substrat
es by direct electron beam evaporation. The structure, composition, and mas
s density of films were investigated as functions of the deposition tempera
ture ranging from ambient temperature to 300 degrees C. The composition of
films determined by infrared spectroscopy, and the residual stresses in fil
ms calculated from the change of the radius of curvature of Si substrates,
were studied as functions of the aging time of films in room air and deposi
tion temperature. The aging behavior is analyzed and discussed in connectio
n with the microstructure and mass density of films. (C) 2000 American Vacu
um Society. [S0734-2101(00)00102-0].