Silicon micromachining for millimeter-wave applications

Citation
B. Guillon et al., Silicon micromachining for millimeter-wave applications, J VAC SCI A, 18(2), 2000, pp. 743-745
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
2
Year of publication
2000
Pages
743 - 745
Database
ISI
SICI code
0734-2101(200003/04)18:2<743:SMFMA>2.0.ZU;2-V
Abstract
We present in this article a very low loss silicon micromachined coplanar t echnology. The design of the structures was achieved through three dimensio nal finite element method electromagnetic simulations. A silicon micromachi ned cavity resonating at 95 GHz with a quality factor greater than 9000 was realized. (C) 2000 American Vacuum Society. [S0734-2101(00)09202-2].