Ballistic transport at room temperature in deeply etched cross-junctions

Citation
K. Hieke et al., Ballistic transport at room temperature in deeply etched cross-junctions, SEMIC SCI T, 15(3), 2000, pp. 272-276
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
15
Issue
3
Year of publication
2000
Pages
272 - 276
Database
ISI
SICI code
0268-1242(200003)15:3<272:BTARTI>2.0.ZU;2-O
Abstract
We measured the transmission through manoscopic cross-junctions at variable temperature and bias. The devices were prepared by deep etching through a two-dimensional electron gas in InGaAs/InP samples. Our experiments show th at the transmission characteristic is partly ballistic even at room tempera ture. The measurements are analysed in terms of an equivalent network, and the involved resistances are related to the electrons' mean free path. Diff erent scattering mechanisms are considered to account for the transition fr om ballistic to diffusive transport.