Electron beam physical vapour deposition of protective films on carbon reinforced carbon

Cr and Ti films on C/C-SiC substrates were obtained by ion assisted electro n beam physical vapour deposition (IA EBPVD) and EBPVD, interrupting the de position process and annealing the substrates. The morphology and propertie s of the films were studied using optical microscopy, scanning electron mic roscopy and X-ray diffraction (XRD) methods. Ion bombardment of the surface during the metal deposition has an influence on the structure of the grown films: by increasing the ion energy from 200 V to 700 V, the grain sizes a re more uniform. X-ray investigations show that residual silicon has an inf luence on the initial stage of chromium deposition. XRD was also used for m easurement of the residual stresses, which depend on the ion energy. (C) 20 00 Elsevier Science S.A. All rights reserved.