Plasma polymer films and their future prospects

Plasma polymerization processes began their fast development in the 1950s. They have been widely recognized during the last 20 years and several succe ssful applications have emerged. Two special groups of plasma polymers that have received increased attention in recent years are treated in detail he re. First, the deposition process and basic properties such as the structur e, morphology, electrical and optical properties, and ageing of metal (Ag, Ni, Mo) and semiconductor (Ge)/hard plasma polymer (C:H) composites are des cribed consisely. The deposition process is based on unbalanced magnetron s puttering with the target operated in an argon/n-hexane working gas mixture . Second, the preparation of plasma polymer films by radio-frequency sputte ring from polymeric targets is introduced and their basic properties, espec ially structure and morphology, are revealed. Most attention is paid to flu orocarbon plasma polymer films sputtered from polytetrafluoroethylene (PTFE ). For both groups of plasma polymers, application possibilities are discus sed. The whole range of plasma polymers and their future prospects are summ arized, starting from those resembling conventional polymers that are prepa red at low power, and ending with the new materials prepared at high power. (C) 2000 Elsevier Science S.A. All rights reserved.