The effect of different scanning schemes on target and film properties in pulsed laser deposition of bismuth

Citation
A. Jacquot et al., The effect of different scanning schemes on target and film properties in pulsed laser deposition of bismuth, APPL SURF S, 156(1-4), 2000, pp. 169-176
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
156
Issue
1-4
Year of publication
2000
Pages
169 - 176
Database
ISI
SICI code
0169-4332(200002)156:1-4<169:TEODSS>2.0.ZU;2-7
Abstract
Thin bismuth films have been prepared on glass substrates at room temperatu re by pulsed laser deposition with a Nd:YAG laser working at a wavelength o f 532 nm, The influence of both target diameter and the way of scanning the laser beam over the target surface on the film quality (droplet density an d film thickness homogeneity) was studied. Scanning electron microscopy and thickness profile analyses were performed on the films. Three different la ser beam scanning schemes have been simulated and tested. Films of high qua lity are obtained using the highest possible target area eroded in the most homogeneous way. This was achieved with an appropriate scanning of the las er beam over the target, for instance with a 'crenel' like scanning or with a scanning at varying speed. Results are discussed in relation to target r oughness. (C) 2000 Elsevier Science B.V. All rights reserved.