Photoablation with sub-10 fs laser pulses

Authors
Lenzner, M Krausz, F Kruger, J Kautek, W
Citation
M. Lenzner et al., Photoablation with sub-10 fs laser pulses, APPL SURF S, 154, 2000, pp. 11-16
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
154
Year of publication
2000
Pages
11 - 16
Database
ISI
SICI code
0169-4332(200002)154:<11:PWSFLP>2.0.ZU;2-Q
Abstract
Ablation experiments in several glasses with single and multishot irradiati on by laser pulses in the 10-fs pulse duration domain are presented; physic al and technological implications are discussed. We demonstrate that these short pulses offer the potential for lateral and vertical machining precisi on of the order of 100 nm. (C) 2000 Elsevier Science B.V. All rights reserv ed.