Ablation study on pulsed KrF laser annealed electroluminescent ZnS : Mn/Y2O3 multilayers deposited on Si

Authors
Mastio, EA Fogarassy, E Cranton, WM Thomas, CB
Citation
Ea. Mastio et al., Ablation study on pulsed KrF laser annealed electroluminescent ZnS : Mn/Y2O3 multilayers deposited on Si, APPL SURF S, 154, 2000, pp. 35-39
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
154
Year of publication
2000
Pages
35 - 39
Database
ISI
SICI code
0169-4332(200002)154:<35:ASOPKL>2.0.ZU;2-U
Abstract
The ZnS:Mn active layer of a thin film electroluminescent (TFEL) device has been annealed under 1.034 MPa (10.34 bar, 150 psi) of argon pressure using a 20-ns pulsed KrF excimer laser. We investigate the effects of multiple s hots at various power densities upon the ablation rates of the ZnS:Mn layer . The results are compared to a thermal simulation of the laser-matter inte raction using single pulse irradiation, and it is inferred that the cubic t o hexagonal transition and melting of ZnS:Mn decrease the ablation rate. (C ) 2000 Published by Elsevier Science B.V. All rights reserved.