Simulation of thin film growth visualization in photodeposition

Citation
A. Peled et al., Simulation of thin film growth visualization in photodeposition, APPL SURF S, 154, 2000, pp. 324-330
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
154
Year of publication
2000
Pages
324 - 330
Database
ISI
SICI code
0169-4332(200002)154:<324:SOTFGV>2.0.ZU;2-A
Abstract
A simulation method was developed to display images of deposited particles and their dynamic 2D growth and coalescence on surfaces, due to mechanisms such as diffusion and coalescence. The method relies on 2D spatial Fourier frequency transforms (FT) of 2D image density functions representing the mi crostructure. These images are convoluted with the FT of spatio-temporal in tegro-differential equations used for modeling the physical driving forces in the frequency domain. Thin film surface growth and restructuring effects during the photodeposition process of amorphous selenium (a-Se) were inves tigated. In particular, the dynamic changes of the photodeposited particles morphology during sub-monolayer growth were analyzed. The comparison betwe en simulation and scanning electron microscopy (SEM) micrographs of photode posited thin films during monolayer formation are in good accordance and co mplementary to one another. (C) 2000 Elsevier Science B.V. All rights reser ved.