On the reaction mechanism in laser-induced deposition of tungsten microstructures from WF6/H-2

Authors
Piglmayer, K Schieche, H Chabicovsky, R
Citation
K. Piglmayer et al., On the reaction mechanism in laser-induced deposition of tungsten microstructures from WF6/H-2, APPL SURF S, 154, 2000, pp. 365-368
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
154
Year of publication
2000
Pages
365 - 368
Database
ISI
SICI code
0169-4332(200002)154:<365:OTRMIL>2.0.ZU;2-W
Abstract
Simultaneous and locally divided deposition and etching of W in WF6 + H-2 a tmosphere is investigated by local laser-induced heating of thin tungsten l ayers on quartz substrates. Model calculations based on reaction kinetics a llow an explanation of the different peculiarities of the deposition/etchin g process. (C) 2000 Elsevier Science B.V. All rights reserved.