Hyperthermal beams for the fabrication of thermoelectric thin films

Citation
Ha. Durand et al., Hyperthermal beams for the fabrication of thermoelectric thin films, APPL SURF S, 154, 2000, pp. 387-392
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
154
Year of publication
2000
Pages
387 - 392
Database
ISI
SICI code
0169-4332(200002)154:<387:HBFTFO>2.0.ZU;2-X
Abstract
The physical mechanisms at the basis of the formation of ultra thin films o f materials are very sensitive to the energy balance at the growing surface . Particularly, this equilibrium is of crucial importance for the fabricati on of complex materials, and in our study the fabrication of thin films of cobalt antimonide in the skutterudite phase as required for thermoelectric applications has been challenging. Using the pulsed excimer laser depositio n in high vacuum we have studied experimentally the influence of the laser energy on the formation of thin films. Combining AFM observation of thin fi lms and the dynamic scaling theory of growing surfaces we studied the respe ctive influence of enhanced surface diffusion and cohesion during the depos ition. We investigated the growth of smooth layer and of skutterudites crys tallites in the deposits and the influence of the laser ablation plume. (C) 2000 Elsevier Science B.V. All rights reserved.