Surface reaction mechanism in MOVPE growth of ZnSe revealed using radicalsproduced by photolysis of alkyl azide

Citation
K. Hayashi et al., Surface reaction mechanism in MOVPE growth of ZnSe revealed using radicalsproduced by photolysis of alkyl azide, APPL SURF S, 154, 2000, pp. 542-547
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
154
Year of publication
2000
Pages
542 - 547
Database
ISI
SICI code
0169-4332(200002)154:<542:SRMIMG>2.0.ZU;2-W
Abstract
Epitaxial growth mechanism of ZnSe under alternate supply of diethylzinc (D EZn) and dimethylselenium (DMSe) was studied by in situ optical monitoring of the growing surface. When H-2 was used as carrier gas, the time-dependen t optical reflectance was found to exhibit a sawtooth pattern under DEZn su pply. The sawtooth reflection signal was also observed in growth experiment s using N-2 carrier gas when DEZn was provided after supply of neutral free radicals produced by laser photolysis of alkyl azide. Based on these exper imental results, microscopic mechanism of growth enhancement by coexistent H-2 is discussed in terms of ab initio quantum chemistry. (C) 2000 Elsevier Science B.V. All rights reserved.