Polymethylmethacrylate (PMMA) has been irradiated by UV-laser light with di
fferent wavelengths (193, 248, 308 nm) in order to modify photolytically it
s refractive index. The photoinduced chemical reactions at the polymer surf
ace have been investigated by QMS, XPS and FTIR and the mechanism of the st
ructure modification has been clarified. It was shown that depending on the
experimental conditions, an increase of the refractive index in the modifi
ed zones could be achieved. The controllable local increase of the refracti
ve index was used to prepare passive integrated-optical waveguides in PMMA
chips. (C) 2000 Elsevier Science B.V. All rights reserved.