MORPHOLOGICAL AND COMPOSITIONAL CHANGES OF THE TARGET SURFACE DURING RF MAGNETRON SPUTTERING OF THE Y-BA-CU-O SYSTEM

Morphological and compositional changes of the target surface during R F magnetron sputtering of an off-stiochiometric Y-Ba-Cu-O (Y:Ba:Cu = 1 :2.6:5) ceramic target have been investigated by optical and scanning electron microscopy, Raman spectroscopy and energy dispersive analysis by X-rays (EDAX). It has been established that the target material co ntains stoichiometric YBa2Cu3O7-delta microcrystals and cuprum oxide a s intermedium. Nearly the same morphology and composition remain durin g sputtering in the region of the erosion zone. Outside the erosion zo ne an unidentified phase with an excess of Cu and a deficit of Ba has been detected. The grown films are stoichiometric but the presence of impurity phases and defects in the films is assumed to originate from the features of sintered off-stoichiometric target sputtering.