Micromachining of high-contrast optical waveguides in < 111 > silicon wafers

Citation
G. Pandraud et al., Micromachining of high-contrast optical waveguides in < 111 > silicon wafers, IEEE PHOTON, 12(3), 2000, pp. 308-310
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE PHOTONICS TECHNOLOGY LETTERS
ISSN journal
10411135 → ACNP
Volume
12
Issue
3
Year of publication
2000
Pages
308 - 310
Database
ISI
SICI code
1041-1135(200003)12:3<308:MOHOWI>2.0.ZU;2-#
Abstract
A fabrication technique by KOH etching for very thin free standing plane pa rallel silicon bridges in a {111} silicon wafer is presented. The applicati ons of such a stress free slab as an evanescent optical waveguide sensor of unusually high sensitivity are discussed.