Formation mechanism of InxGa1-xAs bridge layers on patterned GaAs substrates

Citation
S. Iida et al., Formation mechanism of InxGa1-xAs bridge layers on patterned GaAs substrates, J CRYST GR, 210(4), 2000, pp. 496-504
Citations number
9
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
210
Issue
4
Year of publication
2000
Pages
496 - 504
Database
ISI
SICI code
0022-0248(200003)210:4<496:FMOIBL>2.0.ZU;2-X
Abstract
The formation mechanism of InxGa1-xAs (x = 0.06) bridge layers on patterned GaAs (1 1 1)B substrates using liquid-phase epitaxy has been investigated. For this (i) the effect of density gradient in the solution on the formati on of bridge layer and (ii) growth of bridge layer on [1 1 0] line-seed-sub strates were studied. The convection induced by destabilizing density gradi ent in the solution led to an increase of lateral growth rate of the InGaAs bridge layers on a substrate mounted on the upper portion of the solution. However. it did not have any significant effect on the formation of the br idge layers. The formation of bridge layer on [1 1 0] line-seed-substrate t ook place only for the {1 1 1}B growth fronts. which indicated that "Berg e ffect" is responsible for the formation of bridge layers. (C) 2000 Elsevier Science B.V. All rights reserved.