Formation of semiconductor vertical quantum barriers by epitaxial growth on corrugated surfaces

Citation
G. Biasiol et al., Formation of semiconductor vertical quantum barriers by epitaxial growth on corrugated surfaces, PHYS REV B, 61(11), 2000, pp. 7223-7226
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
10980121 → ACNP
Volume
61
Issue
11
Year of publication
2000
Pages
7223 - 7226
Database
ISI
SICI code
1098-0121(20000315)61:11<7223:FOSVQB>2.0.ZU;2-5
Abstract
The relation hip between growth rate anisotropy, capillarity and entropy of mixing effects, and self-ordering of semiconductor alloy nanostructures gr own on nonplanar surfaces, is investigated theoretically and experimentally . It is shown that self-ordered nanostructures enriched by one component of the alloy or the other are formed, depending on the sign of the surface cu rvature and the growth rate anisotropy. The formation of Al-rich AlxGa1-xAs vertical quantum barriers on convex surfaces with a particular sign of the growth rate anisotropy is experimentally demonstrated.