Ach. Rowe et al., A catchment model of high electric field conduction in high concentration narrow-gap semiconductors, APPL PHYS L, 76(14), 2000, pp. 1902-1904
We present a simple model for mu(E), the field dependence of the mobility,
in polar semiconductors. The resulting four-parameter expression is based o
n a streaming motion idea and a catchment model previously applied to layer
rigidity in intercalated solids. A fitting parameter p, introduced in the
catchment model, is shown to be related to the plasmon screening length. Th
e model is applied to new data for InAs and InSb, and the fit is superior t
o empirical models of similar complexity. We find that energy loss via pure
plasmon or coupled mode scattering is important even for intrinsic InSb. (
C) 2000 American Institute of Physics. [S0003-6951(00)04614-3].