A catchment model of high electric field conduction in high concentration narrow-gap semiconductors

Citation
Ach. Rowe et al., A catchment model of high electric field conduction in high concentration narrow-gap semiconductors, APPL PHYS L, 76(14), 2000, pp. 1902-1904
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
14
Year of publication
2000
Pages
1902 - 1904
Database
ISI
SICI code
0003-6951(20000403)76:14<1902:ACMOHE>2.0.ZU;2-V
Abstract
We present a simple model for mu(E), the field dependence of the mobility, in polar semiconductors. The resulting four-parameter expression is based o n a streaming motion idea and a catchment model previously applied to layer rigidity in intercalated solids. A fitting parameter p, introduced in the catchment model, is shown to be related to the plasmon screening length. Th e model is applied to new data for InAs and InSb, and the fit is superior t o empirical models of similar complexity. We find that energy loss via pure plasmon or coupled mode scattering is important even for intrinsic InSb. ( C) 2000 American Institute of Physics. [S0003-6951(00)04614-3].