Thin film characterization by atomic force microscopy at ultrasonic frequencies

Citation
Kb. Crozier et al., Thin film characterization by atomic force microscopy at ultrasonic frequencies, APPL PHYS L, 76(14), 2000, pp. 1950-1952
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
14
Year of publication
2000
Pages
1950 - 1952
Database
ISI
SICI code
0003-6951(20000403)76:14<1950:TFCBAF>2.0.ZU;2-6
Abstract
We present a technique in which atomic force microscopy at ultrasonic frequ encies is used to determine the thickness of thin films. In this technique, the resonance frequency of a flexural mode of an atomic force microscope c antilever is used to determine the tip-sample contact stiffness. This allow s the film thickness to be determined, provided that the tip and sample ela stic moduli and radii of curvature are known. We report experimental result s for thin metal and polymer films deposited on silicon substrates and comp are them with the predictions of a theoretical model. (C) 2000 American Ins titute of Physics. [S0003-6951(00)00114-5].