Microwave absorption in electron cyclotron resonance plasma

Citation
Mh. Liu et al., Microwave absorption in electron cyclotron resonance plasma, CHIN PHYS L, 17(1), 2000, pp. 31-33
Citations number
11
Categorie Soggetti
Physics
Journal title
CHINESE PHYSICS LETTERS
ISSN journal
0256307X → ACNP
Volume
17
Issue
1
Year of publication
2000
Pages
31 - 33
Database
ISI
SICI code
0256-307X(2000)17:1<31:MAIECR>2.0.ZU;2-I
Abstract
The microwave power absorption in electron cyclotron resonance plasma react or was investigated with a two-dimensional hybrid-code. Simulation results indicated that there are two typical power deposition peaks on the axis and decreases in radial direction, (2) microwave power deposition has its maxi mum at some radial position, i.e., a hollow distribution. The spatial distr ibution of electron temperature resembles always to the microwave power abs orption profile. The dependence of plasma parameter on the gas pressure is discussed also.