The paper describes the results of electrochemical investigations of Ni-Co
deposition from a sulfamate bath in the presence of boric acid and two addi
tives. The individual deposition of nickel was shown to be partly inhibited
by the adsorption of sulfamate ions at low polarization; such inhibition w
as not observed for cobalt. The introduction of saccharin at 100 ppm, with
a wetting agent seems to hinder sulfamate adsorption and Ni deposition depa
rts at less cathodic potentials. The presence of cobalt has no effect on ni
ckel deposition, whereas cobalt deposition is hindered by the presence of n
ickel in the bath. Galvanostatic deposition was carried out at the surface
of a RDE and with a rotating cylinder Hull cell. At low current densities d
eposits with a Co content of approx. 40% were produced, but this content wa
s shown to decrease with the applied current density. Examination of experi
mental data showed that cobalt deposition is diffusion-controlled and that
Co content decreases with the applied current density relative to the limit
ing current density.