Rm. Biefeld et al., InAsSb/InPSb strained-layer superlattice growth using metal-organic chemical vapor deposition, J CRYST GR, 211(1-4), 2000, pp. 400-404
We report on the metal-organic chemical vapor deposition (MOCVD) of straine
d layer superlattices (SLSs) of InAsSb/InPSb as well as mid-infrared optica
lly pumped lasers grown using a high-speed rotating disk reactor (RDR). The
devices contain AlAsSb cladding layers and strained, type-I, InAsSb/InPSb
active regions. By changing the layer thickness and composition of InAsSb/I
nPSb SLSs, we have prepared structures with low-temperature ( < 20 K) photo
luminescence wavelengths ranging from 3.4 to 4.8 mu m. We find a variation
in band gap of 0.272-0.324 eV for layer thicknesses of 9.0-18.2 nm From the
se data we have estimated a valence band offset for the InAsSb/InPSb interf
ace of about 400 meV. The optical properties of the superlattices revealed
an anomalous low-energy transition that can be assigned to an antimony-rich
interfacial layer in the superlattice. An InAsSb/InPSb SLS, laser was grow
n on an InAs substrate with AlAs0.16Sb0.84 cladding layers. A lasing thresh
old and spectrally narrowed laser emission were seen from 80-200 K, the max
imum temperature where lasing occurred. The temperature dependence of the S
LS laser threshold is described by a characteristic temperature. T-0 = 72 K
. from 80 to 200 K. (C) 2000 Elsevier Science B.V. All rights reserved.