InAsSb/InPSb strained-layer superlattice growth using metal-organic chemical vapor deposition

Citation
Rm. Biefeld et al., InAsSb/InPSb strained-layer superlattice growth using metal-organic chemical vapor deposition, J CRYST GR, 211(1-4), 2000, pp. 400-404
Citations number
5
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
211
Issue
1-4
Year of publication
2000
Pages
400 - 404
Database
ISI
SICI code
0022-0248(200004)211:1-4<400:ISSGUM>2.0.ZU;2-P
Abstract
We report on the metal-organic chemical vapor deposition (MOCVD) of straine d layer superlattices (SLSs) of InAsSb/InPSb as well as mid-infrared optica lly pumped lasers grown using a high-speed rotating disk reactor (RDR). The devices contain AlAsSb cladding layers and strained, type-I, InAsSb/InPSb active regions. By changing the layer thickness and composition of InAsSb/I nPSb SLSs, we have prepared structures with low-temperature ( < 20 K) photo luminescence wavelengths ranging from 3.4 to 4.8 mu m. We find a variation in band gap of 0.272-0.324 eV for layer thicknesses of 9.0-18.2 nm From the se data we have estimated a valence band offset for the InAsSb/InPSb interf ace of about 400 meV. The optical properties of the superlattices revealed an anomalous low-energy transition that can be assigned to an antimony-rich interfacial layer in the superlattice. An InAsSb/InPSb SLS, laser was grow n on an InAs substrate with AlAs0.16Sb0.84 cladding layers. A lasing thresh old and spectrally narrowed laser emission were seen from 80-200 K, the max imum temperature where lasing occurred. The temperature dependence of the S LS laser threshold is described by a characteristic temperature. T-0 = 72 K . from 80 to 200 K. (C) 2000 Elsevier Science B.V. All rights reserved.