EPR study of He-implanted Si

Citation
B. Pivac et al., EPR study of He-implanted Si, MAT SCI E B, 73(1-3), 2000, pp. 60-63
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
73
Issue
1-3
Year of publication
2000
Pages
60 - 63
Database
ISI
SICI code
0921-5107(20000403)73:1-3<60:ESOHS>2.0.ZU;2-7
Abstract
Electron paramagnetic resonance has been used to study the influence of the rmal treatments on defect evolution in helium-implanted Czochralski single- crystal silicon. It is shown that the thermal treatment induces helium migr ation and capturing by vacancy clusters that transform into pressurized bub bles. Such transformation produces a strain field, which in turn affects th e dangling bond's lineshape in its vicinity. It is shown that the strain fi eld causes asymmetry of dangling bond lineshape that is proportional to the strain field. This selects the electron paramagnetic resonance as a conven ient technique For the monitoring of the early phases of bubble formation. (C) 2000 Elsevier Science S.A. All rights reserved.