Random telegraphic signals in rapid thermal annealed silicon-silicon oxidesystem

Citation
Wk. Chim et al., Random telegraphic signals in rapid thermal annealed silicon-silicon oxidesystem, MAT SCI E B, 72(2-3), 2000, pp. 135-137
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
72
Issue
2-3
Year of publication
2000
Pages
135 - 137
Database
ISI
SICI code
0921-5107(20000315)72:2-3<135:RTSIRT>2.0.ZU;2-3
Abstract
Random telegraphic signals (RTS) have been observed in large-area aluminium -silicon oxide-silicon capacitors, rapid thermal annealed (RTA) in argon at 600-700 degrees C for 50 s. The noise spectra of these devices at higher b iases showed a Lorenztian spectrum between 30-400 Hz. We suggested that the RTA process has produced weak spots in the devices. The filling and emptyi ng process of a trap near the weak spot modulates the barrier height and re sulted in the RTS and Lorentzian spectrum observed in these devices. (C) 20 00 Elsevier Science S.A. All rights reserved.