In situ observation of the Si melt-silica glass interface concerning CZ-Sicrystal growth

Citation
Xm. Huang et al., In situ observation of the Si melt-silica glass interface concerning CZ-Sicrystal growth, MAT SCI E B, 72(2-3), 2000, pp. 164-168
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
72
Issue
2-3
Year of publication
2000
Pages
164 - 168
Database
ISI
SICI code
0921-5107(20000315)72:2-3<164:ISOOTS>2.0.ZU;2-V
Abstract
An in situ observation was carried out for investigating the interfacial ph ase of so-called 'brownish rings' formed at the Si melt-silica glass interf ace concerning Czochralski (CZ) silicon crystal growth. It is found that so me small dots appeared at the interface immediately after the Si melting, a nd grew gradually. The growth rate of the interfacial phase increases with increasing temperature, and it is almost the same when the silica dissoluti on rate is lower than a critical value. It can be concluded, therefore, tha t the growth rate of the interfacial phase does not depend on the silica di ssolution rate in a practical CZ-Si crystal growth by considering that the silica dissolution rate in CZ-Si crystal growth is also lower than the crit ical value. Crystalline phase forms from the central region of the interfac ial phase, and the amount of the crystalline phase increases with increasin g temperature and reaction time. (C) 2000 Elsevier Science S.A. All rights reserved.