Range parameters of aluminium implants in medium and heavy mass metals

Nuclear reaction analysis was used to determine the range profiles of 150 k eV aluminium ions implanted into a variety of metal targets in the atomic n umber region of 23 less than or equal to Z(2) less than or equal to 78. Imp lantations were performed at room temperature with fluences of 5 x 10(16) A l+ cm(-2) and dose rates below 10(13) Al+ cm(-2) s(-1) to prevent excessive target heating. Profiles were determined by detecting the 10.76 MeV photon s from the Al-27(p,gamma)Si-28 resonance reaction at 992 keV as a function of proton energy. Range profiles were extracted from the excitation curve a fter correcting for proton straggling. The experimental profiles and range moments are compared with TRIM predictions, taking target sputtering effect s into account. (C) 2000 Published by Elsevier Science B.V. All rights rese rved.