Tritium depth profiling measurements by accelerator mass spectrometry have
been performed at the facility installed at the Rossendorf 3 MV Tandetron.
In order to achieve a uniform erosion at the target surface inside a commer
cial Cs ion sputtering source and to avoid edge effects, the samples were m
echanically scanned and the signals were recorded only during sputtering at
the centre of the sputtered area. The sputtered negative ions were mass an
alysed by the injection magnet of the Tandetron. Hydrogen and deuterium pro
files were measured with the Faraday cup between the injection magnet and t
he accelerator, while the tritium was counted after the accelerator with se
miconductor detectors. Depth profiles have been measured for carbon samples
which had been exposed to the plasma at the first wall of the Garching fus
ion experiment ASDEX-Upgrade and from the European fusion experiment JET, C
ulham, UK. (C) 2000 Elsevier Science B.V. All rights reserved.