Synthesis of CoSi2-structures using ion microprobes

The superconducting microbeam system at Bochum demonstrates that microbeam systems can be successfully used as an implantation tool. The system, serve d by a 4 MV-tandem accelerator, is able to produce a wide range of ion spec ies with high purity. The advantage of a microprobe facility as an implante r is the possibility to produce buried structures at a lateral resolution i n the submicron range with a penetration depth between 100 nm and a few mu m without the use of any resist. Because of the high demagnification of the microprobe system the ion current density is increased two orders of magni tude compared to conventional MeV implantation. In combination with the new ly developed high energy ion projection technique, the system yields a very fast implantation of structures at stoichiometric doses, thus allowing to optimize the process of ion beam synthesis within reasonable time. This con tribution gives an introduction to the technique of high energy ion project ion and reports some first results of CoSi2 structures synthesized by impla ntation of 1 MeV Co into Si. The experiments are performed using different implantation temperatures, currents, and doses, and will be discussed in co mparison to the conventional implantation technique. (C) 2000 Elsevier Scie nce B.V. All rights reserved.