Ion-beam-induced magnetic texturing of thin nickel films

Citation
K. Zhang et al., Ion-beam-induced magnetic texturing of thin nickel films, NUCL INST B, 161, 2000, pp. 1016-1021
Citations number
19
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
161
Year of publication
2000
Pages
1016 - 1021
Database
ISI
SICI code
0168-583X(200003)161:<1016:IMTOTN>2.0.ZU;2-R
Abstract
The texturing of thin metallic and ceramic films caused by heavy-ion implan tation is a common observation, but still lacks quantitative explanations. Magnetic texturing effects of polycrystalline Fe-films irradiated with Xe i ons have recently been reported. In this paper, we present results of simil ar experiments for 18-400 nm thick polycrystalline Ni-films on Si (1 0 0) s ubstrates after irradiating them with 2 x 10(14)-1 x 10(16) Xe+-ions/cm(2) at 77 K and at ion energies of 6-450 keV, in the presence of a small magnet ic field of the order of 1 G, The magnetization was measured by means of th e magneto-optical Kerr effect (MOKE), as function of several parameters suc h as fluence, energy and spot size of the ion beam, thickness and shape of the Ni film and the thermal annealing procedures after irradiation. (C) 200 0 Elsevier Science B.V. All rights reserved.