The effects of He implantation on the thermal stability of Cu-Al precipitates in aluminum

Citation
G. Feldmann et al., The effects of He implantation on the thermal stability of Cu-Al precipitates in aluminum, NUCL INST B, 161, 2000, pp. 1075-1079
Citations number
13
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
161
Year of publication
2000
Pages
1075 - 1079
Database
ISI
SICI code
0168-583X(200003)161:<1075:TEOHIO>2.0.ZU;2-K
Abstract
In this contribution we report on the effects of He on the formation and th ermal evolution of Cu-Al precipitates produced after Cu+ and He+ ion implan tation in pure Al foils, The profiles of Cu and He were measured via Ruther ford Backscattering (RBS) and Elastic Recoil Detection Analysis (ERDA) tech niques, respectively, and the precipitate and bubble morphology were invest igated by TEM. After thermal annealing, we observe a retardation of the Cu- Al precipitates coarsening and a Cu redistribution governed by the presence of He bubbles. Our results are discussed in terms of an overpressurized bu bble system, which reduces the local vacancy concentration and affects the diffusional process, (C) 2000 Elsevier Science B.V. All rights reserved.