Midinfrared Hall effect in thin-film metals: Probing the Fermi surface anisotropy in Au and Cu

Citation
J. Cerne et al., Midinfrared Hall effect in thin-film metals: Probing the Fermi surface anisotropy in Au and Cu, PHYS REV B, 61(12), 2000, pp. 8133-8140
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
10980121 → ACNP
Volume
61
Issue
12
Year of publication
2000
Pages
8133 - 8140
Database
ISI
SICI code
1098-0121(20000315)61:12<8133:MHEITM>2.0.ZU;2-S
Abstract
A sensitive midinfrared (MIR, 900-1100 cm(-1): 112-136 meV) photoelastic po larization modulation technique is used to measure simultaneously Faraday r otation and circular dichroism in thin metal films. These two quantities de termine the complex ac Hall conductivity. This technique is applied to stud y Au and Cu thin films at temperatures in the range (300 K > T > 20 K), and magnetic fields up to 8 T. The Hall frequency omega(H) is consistent with band theory predictions. We report a measurement of the MIR Hall scattering rate gamma(H) which is significantly lower than that derived from Drude an alysis of zero magnetic field MIR transmission measurements. This differenc e is qualitatively explained in terms of the anisotropy of the Fermi surfac e in Au and Cu.