The tight-binding molecular dynamics method with hot electrons is used to s
imulate the laser-induced melting of silicon. The results are in good agree
ment with previous ab initio simulation and experimental data. Our findings
assess the reliability of the tight-binding model to describe silicon with
a high concentration of excited electrons. The role of volume changes in t
he laser-induced melting has also been addressed within constant-pressure t
ight-binding molecular dynamics.