Scaling behavior of cyclical surface growth

The scaling behavior of cyclical surface growth (e.g., deposition/desorptio n), with the number of cycles, n, is investigated. The roughness of surface s grown by two linear primary processes follows a scaling behavior with asy mptotic exponents inherited from the dominant process while the effective a mplitudes are determined by both. Relevant nonlinear effects in the primary processes may remain so or be rendered irrelevant. Numerical simulations f or several pairs of generic primary processes confirm these conclusions. Ex perimental results for the surface roughness during cyclical electrodeposit ion/dissolution of silver show a power-law dependence on II, consistent wit h the scaling description.