Growth of YBa2CU3O7-delta thin films in pulsed laser deposition: influenceof target, substrate and deposition rate

Citation
Ga. Farnan et al., Growth of YBa2CU3O7-delta thin films in pulsed laser deposition: influenceof target, substrate and deposition rate, SUPERCOND S, 13(3), 2000, pp. 262-272
Citations number
28
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SUPERCONDUCTOR SCIENCE & TECHNOLOGY
ISSN journal
09532048 → ACNP
Volume
13
Issue
3
Year of publication
2000
Pages
262 - 272
Database
ISI
SICI code
0953-2048(200003)13:3<262:GOYTFI>2.0.ZU;2-B
Abstract
The growth of smooth, high quality, c-axis thin films of optimally doped YB a2Cu3O7-delta on (001) MgO substrates has been studied using pulsed laser d eposition. The films were characterized with Auger spectroscopy, x-ray diff raction, self-inductance and four-probe resistance techniques. We have foun d an interesting interaction between deposition rate, substrate topography and target oxygenation in the determination of film quality. The best films are produced with dense underoxygenated targets at low laser repetition ra tes (1 Hz) on very smooth substrates; the optimal deposition parameters For these are given. Atomic force microscopy shows spiral growth formations wi th a unit-cell edge height. Oriented outgrowths observed on some films are attributed to heat-modified substrate surface morphology. a-asis films also have been grown using PrBa2Cu3Ox template layers.