Comparison of filtered high-current pulsed arc deposition (phi-HCA) with conventional vacuum arc methods

Special features of the filtered high-current pulsed are deposition (phi-HC A) are presented in comparison with the conventional de-are method. The hig h-current are technique allows pulse currents of some kiloamperes and avera ged are currents of approximately 1 kA. Due to the high spot velocity the d roplet density is already markedly reduced. The remaining particles may be completely eliminated by combination with a magnetic filter. The optimum de sign of this device together with the high efficiency of the pulsed are sou rce yields ion currents at the filter exit above 100 A during a pulsed are and above 10-A averaged current. High quality films with deposition rates o f industrial relevance may be produced by advanced are techniques. Various coatings such as metal refractory nitrides, oxides and hard coatings are in vestigated and compared with the conventional de-are deposition. It is show n that the phi-HCA module is a promising supplementary device that can be a ttached to industrial standard equipment for Various applications demanding smooth mirror-like metallic hard coatings. (C) 2000 Elsevier Science S.A. All rights reserved.