Nonuniform defect distribution in GaN thin films examined by cathodoluminescence

Citation
Em. Goldys et M. Godlewski, Nonuniform defect distribution in GaN thin films examined by cathodoluminescence, APPL PHYS A, 70(3), 2000, pp. 329-331
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
70
Issue
3
Year of publication
2000
Pages
329 - 331
Database
ISI
SICI code
0947-8396(200003)70:3<329:NDDIGT>2.0.ZU;2-1
Abstract
Room-temperature cathodoluminescence depth-profiling studies of GaN films g rown on sapphire and on SiC are reported. The spectral characteristics were quantitatively analysed taking into account reabsorption effects. We show that whereas GaN films grown on sapphire show a uniform defect distribution , in GaN grown on SiC the defect density is clearly nonuniform and new, low -energy lines appear in emission from deeper layers in the film.