In situ growth study of NiMnSb films on MgO(001) and Si(001)

Authors
Schlomka, JP Tolan, M Press, W
Citation
Jp. Schlomka et al., In situ growth study of NiMnSb films on MgO(001) and Si(001), APPL PHYS L, 76(15), 2000, pp. 2005-2007
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
15
Year of publication
2000
Pages
2005 - 2007
Database
ISI
SICI code
0003-6951(20000410)76:15<2005:ISGSON>2.0.ZU;2-H
Abstract
The sputter deposition of thin magnetic NiMnSb films on MgO(001) and Si(001 ) is investigated by in situ x-ray scattering. It is shown that the roughne ss of the layers as a function of the film thickness increases according to power laws with unusually large growth exponents. The optimum growth condi tions are found on the substrate MgO(001) at temperatures of 250 degrees C during the deposition. (C) 2000 American Institute of Physics. [S0003-6951( 00)00415-0].