Synchrotron-radiation-induced, selective-area deposition of gold on polyimide from solution

Room-temperature photoinduced, selective-area deposition of gold films on p olyimide from gold salt solution using synchrotron radiation x rays is desc ribed. A film growth rate as high as 40 nm/min is obtained. For thickness < 50 nm, the films consist of nanograins with a grain size of about 200 nm. For thicker films, gold deposit forms a ramified morphology on top of the n anograin film. The change in morphology is discussed in terms of the change in the yield of the photoelectrons generated by x rays as a function of gr owth. (C) 2000 American Institute of Physics. [S0003-6951(00)01815-5].