The carbon ion energy used during filtered cathodic vacuum arc deposition d
etermines the bonding topologies of amorphous-carbon (a-C) films. Regions o
f relatively low density occur near the substrate/film and film/surface int
erfaces; their thicknesses increase with deposition energy. The ion subplan
tation growth results in mass density gradients in the bulk portion of a-C
in the growth direction; density decreases with distance from the substrate
for films grown using ion energies < 60 eV and increases for films grown u
sing ion energies > 160 eV. Films grown between these energies are the most
diamondlike with relatively uniform bulk density and the highest optical t
ransparencies. Bonding topologies evolve with increasing growth energy cons
istent with the propagation of subplanted carbon ions inducing a partial tr
ansformation of sigma- to pi-bonded carbon atoms. (C) 2000 American Institu
te of Physics. [S0003-6951(00)05615-1].