Spatial concentration and temperature distribution of CH radicals formed in a diamond thin-film hot-filament reactor

Authors
Lommatzsch, U Wahl, EH Owano, TG Kruger, CH Zare, RN
Citation
U. Lommatzsch et al., Spatial concentration and temperature distribution of CH radicals formed in a diamond thin-film hot-filament reactor, CHEM P LETT, 320(3-4), 2000, pp. 339-344
Citations number
32
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
320
Issue
3-4
Year of publication
2000
Pages
339 - 344
Database
ISI
SICI code
0009-2614(20000407)320:3-4<339:SCATDO>2.0.ZU;2-O
Abstract
Spatial concentration and temperature profiles of the CH radical in a hot-f ilament chemical vapor deposition reactor are measured by cavity ring-down spectroscopy. The CH concentration is found to be on the order of 10(11) mo lecules/cm(3). The spatial distribution indicates that CH formation primari ly occurs at or very near the filament. At a distance of 2 mm from the fila ment the [H]/[H-2] ratio is determined to be 0.011 +/- 0.003. (C) 2000 Else vier Science B.V. All rights reserved.