Independent contacts to a double-electron gas using mesoscopic surface gates

Citation
Sa. Nield et al., Independent contacts to a double-electron gas using mesoscopic surface gates, J APPL PHYS, 87(8), 2000, pp. 4036-4038
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
8
Year of publication
2000
Pages
4036 - 4038
Database
ISI
SICI code
0021-8979(20000415)87:8<4036:ICTADG>2.0.ZU;2-B
Abstract
We demonstrate how two two-dimensional electron gases can be independently contacted using only surface gates defined by electron-beam lithography: ma croscopic bar gates to contact the lower layer, and mesoscopic split gates to contact the upper layer. When the technique is applied to a sample consi sting of two 150 Angstrom GaAs wells separated by 300 Angstrom Al0.33Ga0.67 As barrier, there is more than 30 M Omega isolation at 5 K for interlayer v oltages up to +/- 30 mV; the interlayer isolation operates up to 30 K. The independent contacts are used for a preliminary investigation of two parall el one-dimensional quantum wires. (C) 2000 American Institute of Physics. [ S0021-8979(00)05208-7].