Development of optical methods and equipment for controlling the manufacturing and parameters of semiconductor structures of nano- and microelectronics

Authors
Kovalev, VI Rukovishnikov, AI Perov, PI Rossukanyi, NM Avdeeva, LA
Citation
Vi. Kovalev et al., Development of optical methods and equipment for controlling the manufacturing and parameters of semiconductor structures of nano- and microelectronics, J COMMUN T, 44(11), 1999, pp. 1296-1300
Citations number
13
Categorie Soggetti
Information Tecnology & Communication Systems
Journal title
JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS
ISSN journal
10642269 → ACNP
Volume
44
Issue
11
Year of publication
1999
Pages
1296 - 1300
Database
ISI
SICI code
1064-2269(199911)44:11<1296:DOOMAE>2.0.ZU;2-Q
Abstract
Optical techniques and devices for controlling the parameters of semiconduc tor structures and manufacturing processes are developed. Novel multi-purpo se optical-polarization elements are created, and, on their basis, various precision automatic reflectometers, ellipsometers, and reflection-different ial spectrometers are designed and manufactured.