Ge/Ag(111): Surface alloy of a semiconductor on a metal

Citation
H. Oughaddou et al., Ge/Ag(111): Surface alloy of a semiconductor on a metal, SURF REV L, 6(5), 1999, pp. 929-934
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SURFACE REVIEW AND LETTERS
ISSN journal
0218625X → ACNP
Volume
6
Issue
5
Year of publication
1999
Pages
929 - 934
Database
ISI
SICI code
0218-625X(199910)6:5<929:GSAOAS>2.0.ZU;2-K
Abstract
We present one of the first experimental studies of the formation of an ord ered surface alloy of a semiconductor, Ge, and a metal, Ag, with bulk tende ncy to phase separation. The kinetics of growth at room temperature as well as the surface segregation of Ge have been investigated for the (111) orie ntation using Auger Electron Spectroscopy (AES) and Low Electron Energy Dif fraction (LEED). The growth mode of Ge on Ag(111) is layer-by-layer like up to at least two layers. An unexpected ordered surface alloy forming a p(root 3 x root 3)R30 degrees superstructure is observed during the growth at 1/3 germanium mono layer, followed by a p(7 x 7) superstructure at one-monolayer coverage. The surface Ge segregation studied via both dissolution and segregation kineti cs shows the particular stability of the ordered p(root 3 x root 3)R30 degr ees surface alloy.