Base transit time in abrupt GaN/InGaN/GaN HBT's

Citation
Sy. Chiu et al., Base transit time in abrupt GaN/InGaN/GaN HBT's, IEEE DEVICE, 47(4), 2000, pp. 662-666
Citations number
17
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
47
Issue
4
Year of publication
2000
Pages
662 - 666
Database
ISI
SICI code
0018-9383(200004)47:4<662:BTTIAG>2.0.ZU;2-E
Abstract
Base transit time in an abrupt GaN/InGaN/GaN HBT is reported. Temperature a nd doping concentration dependence of low field mobility is obtained from a n ensemble Monte Carlo simulation. Base transit time, tau(b), decreases wit h increasing temperature. The low temperature tau(b) is dominated by the di ffusion constant or, in other words, transport within the neutral base regi on. However, at elevated temperatures base transit time is dependent more u pon the base-collector junction velocity or, in other words, by the transpo rt across the heterointerface. tau(b) increases with In-mole fraction showi ng a stronger dependence at lower temperatures. Unity gain current cut-off frequency, f(T), is a strong function of temperature and base doping concen tration, An f(T) of 20 GHz is obtained for a 0.05 mu m HBT.