Preferred orientation of copper phthalocyanine thin films evaporated on amorphous substrates

Citation
R. Resel et al., Preferred orientation of copper phthalocyanine thin films evaporated on amorphous substrates, J MATER RES, 15(4), 2000, pp. 934-939
Citations number
41
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
15
Issue
4
Year of publication
2000
Pages
934 - 939
Database
ISI
SICI code
0884-2914(200004)15:4<934:POOCPT>2.0.ZU;2-F
Abstract
A series of copper phthalocyanine thin films were prepared on amorphous sub strates using physical vapor deposition at ambient temperature. Different s ample preparation conditions were used: the deposition rate was varied, and the substrates was static or rotating. The preferred orientation in the th in film was studied as a function of the deposition conditions. X-ray diffr action analysis was performed using theta/2 theta and pole figure measureme nts. In the case of layers prepared at low deposition rates and using nonro tating: substrates, a very strong fiber texture was detected with (100) cry stallographic planes oriented preferably parallel to the substrate surface. At higher deposition rates, an additional second type of preferred orienta tion was observed with (110) planes oriented preferably parallel to the sub strate surface. In the case of layers prepared with rotational substrates, the (110) type of preferred orientation was quantitatively more strongly de veloped, If we consider electronic band structure calculations, these resul ts imply that the electron/hole transport through the thin films is enhance d for films prepared at high deposition rates and rotating substrates.