Mossbauer study of titanium implanted alpha-Fe

Citation
M. Kopcewicz et al., Mossbauer study of titanium implanted alpha-Fe, J PHYS-COND, 12(10), 2000, pp. 2297-2303
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
12
Issue
10
Year of publication
2000
Pages
2297 - 2303
Database
ISI
SICI code
0953-8984(20000313)12:10<2297:MSOTIA>2.0.ZU;2-Y
Abstract
Bulk alpha-Fe has been implanted with 200 keV Ti ions with doses ranging fr om 1 x 10(17) to 8 x 10(17) at. Ti cm(-2) and characterized by conversion e lectron Mossbauer spectroscopy (CEMS). The GEMS spectra recorded for the lo w dose Ti implantation of the surface region reveal the formation of the cr ystalline phases (bcc-FeTi solid solution and FeTi intermetallic compound) and of the amorphous Fe-Ti-C phase. For Ti doses exceeding 4 x 10(17) at. T i cm(-2) the amorphous FeTi phase is formed, whose relative spectral fracti on saturates at about 40% of the total spectral area at 6 x 10(17) at. Ti c m(-2). At high ion doses the amorphous Fe-Ti-C phase disappears but the bcc -FeTi and crystalline intermetallic FeTi phases persist, beside the amorpho us FeTi phase, even at the highest Ti dose used.