Measurements of nanometer scale interface diffusion between tungsten and niobium thin films using high frequency laser based ultrasound

This article presents the use of a quantitative analysis technique to descr ibe time-resolved acoustic spectroscopy (high frequency laser based ultraso und) measurements of atomic diffusion on nanometer length scales occurring at the interface between sputter-deposited tungsten and niobium films. The extent of diffusion at the tungsten-niobium interface is determined by comp aring experimental, simulated, and theoretical transfer functions between a coustic arrivals. The experimental and simulated transfer functions use the spectral content of successive reflected acoustic waves and the theoretica l transfer function is based on the transfer matrix of an equivalent strati fied interface region. This combination of theoretical, simulated, and expe rimental analyses makes it possible to separate signals with distinct diffe rences between the as-deposited interface and those interfaces diffused to an experimentally determined 0.8-nm and 1.4-nm extent. Comparison of predic ted and measured diffusion depths for this diffusion couple indicates that bulk diffusivities are not appropriate for describing nanometer scale inter face diffusion. (C) 2000 Acoustical Society of America. [S0001-4966(00)0190 4-4].