Wide-angle far-field line generation using a simple optical system consisti
ng of a cylindrical lens and a resonance-domain diffractive beam-shaping el
ement is proposed. The desired intensity distribution is realized as a loca
l average of the coherent superposition of the component fields in differen
t diffraction orders of a multiple-beam-splitter grating with nanoscale tra
nsverse features. Fabrication tolerances of the proposed method are investi
gated and the system is demonstrated experimentally using electron beam lit
hography and reactive ion etching. (C) 2000 Elsevier Science B.V. All right
s reserved.