Atomic force microscopy in the surface characterization of semiconductors and superconductors

Authors
Citation
Rs. Gonnelli, Atomic force microscopy in the surface characterization of semiconductors and superconductors, PHIL MAG B, 80(4), 2000, pp. 599-609
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICSELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
ISSN journal
13642812 → ACNP
Volume
80
Issue
4
Year of publication
2000
Pages
599 - 609
Database
ISI
SICI code
1364-2812(200004)80:4<599:AFMITS>2.0.ZU;2-F
Abstract
In the present paper I summarize the recent experience of my laboratory in the field of atomic force microscopy (AFM) applied to the study of the surf aces of both semiconducting and superconducting materials. I show that very useful results, both in fundamental and in applied physics, can be obtaine d by using simple contact-mode AFM in air, provided that particular attenti on is paid to the vibration isolation of the experimental set-up and to the cleavage of the samples' surface just before the measurement. Some example s are presented from the study of conventional and high-T-c layered superco nductors up to the atomic resolution, to the precise determination of the t hickness of GaAs/AlAs multilayers and of the best deposition parameters for the sputtering of piezoelectric thin films.