Inhomogeneous transport in microcrystalline p-i-n devices

Citation
M. Vieira et al., Inhomogeneous transport in microcrystalline p-i-n devices, PHIL MAG B, 80(4), 2000, pp. 755-764
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICSELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
ISSN journal
13642812 → ACNP
Volume
80
Issue
4
Year of publication
2000
Pages
755 - 764
Database
ISI
SICI code
1364-2812(200004)80:4<755:ITIMPD>2.0.ZU;2-K
Abstract
Entirely microcrystalline hydrogenated silicon p-i-n structures presenting an enhanced sensitivity to the near-infrared region (greater than 1000 nm) are analysed under different external voltage biases and light illumination conditions. A two-phase model to explain the transport properties is propo sed using as input parameters the measured experimental data. The role play ed by the boundary regions between the crystalline grains and the amorphous tissue is treated similarly to a junction interface and leads to the prese nce of local electric fields. The influence of the local electric field on the transport mechanism is outlined. The results show that the transport is preferentially concentrated in the crystalline grains. The conduction with in the amorphous regions is poor and it contributes to the transport only b y allowing a percolation path of the carriers through the crystalline grain s. The percolation paths are different for electrons and holes and are dete rmined by the local fields at the boundaries. These local fields are indepe ndent of the externally applied condition, and they can be related to the p resence of the small positive photocurrent observed when a bias voltage is applied, which is higher than the open-circuit voltage.